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Unique semiconductor technology for next generations of microchips enabling cost savings and increases of performance by 20% and more

German high-tech SME with focus on micro-engineering tools for processing semiconductors developed a novel high-energy ion implantation technology, based on energy filter for ion implantation (EFII), enable very precise, depth-distributed doping of any desired semiconductor material (e.g. SiC). Seeking companies from semiconductor sector and foundries using ion implantation or producing ion beam accelerators, for technical cooperation and commercial agreements with technical assistance.

: TODE20180813002

Mas información: Instituto de Fomento de la Región de Murcia